Importance of trimethylaluminum diffusion in three-step ABC molecular layer deposition using trimethylaluminum, ethanolamine, and maleic anhydride.

Second Harmonic Generation Diagnostic of Layer by Layer Deposition from Disperse Red 1–Functionalized Maleic Anhydride Copolymer

Layer-by-layer (LBL) electrostatic assembly of poly-electrolytes is proving to be an increasingly rich and versatile technique for the formation of multilayered thin films with a wide range of electrical, magnetic, and optical properties. In the present work we synthesized a new nonlinear optical (NLO) maleic acid copolymer containing Disperse Red 1 moieties, built-up multilayer assemblies by a...

Atomic Layer Deposition of a High-k Dielectric on MoS2 Using Trimethylaluminum and Ozone

We present an Al2O3 dielectric layer on molybdenum disulfide (MoS2), deposited using atomic layer deposition (ALD) with ozone/trimethylaluminum (TMA) and water/TMA as precursors. The results of atomic force microscopy and low-energy ion scattering spectroscopy show that using TMA and ozone as precursors leads to the formation of uniform Al2O3 layers, in contrast to the incomplete coverage we ob...

Atomic layer deposition of platinum with enhanced nucleation and coalescence by trimethylaluminum pre-pulsing

Nucleation and Growth of Silver Nanoparticles by AB and ABC-Type Atomic Layer Deposition

In this work, we report synthesis strategies to produce Ag nanoparticles by AB-type and ABC-type atomic layer deposition (ALD) using trimethylphosphine(hexafluoroacetylacetonato) silver(I) ((hfac)Ag(PMe3)) and formalin (AB-type) and (hfac)Ag(PMe3), trimethylaluminum, and H2O (ABC-type). In situ quartz crystal microbalance measurements reveal a Ag growth rate of 1−2 ng/cm/cycle by ABC-type ALD a...

Spectroscopic Study of AlN Film Formation by the Sequential Reaction of Ammonia and Trimethylaluminum on Alumina

Aluminum nitride is grown on an alumina substrate by several sequential exposures to trimethyl aluminum and ammonia. Broad similarities are evident between the chemistry in this case and that found for the reaction between trimethylaluminum and water except that temperatures of in excess of 500 K are required to form AlN layers whereas alumina is formed at room temperature. It is found, using i...